Innos, the UK's leading research and development company delivering expertise in silicon, MEMS and nanotechnologies, today announced its involvement in an EPSRC-funded project collaborative between Liverpool and Southampton Universities, which has demonstrated how high performance MOSFETs used in radio frequency applications can be manufactured at a low cost. The advance could enable more small to medium sized businesses to enter the radio frequency applications market and be used as part of a sensor network within ‘ambient intelligence' systems.

The research conducted at Liverpool and Southampton Universities shows how the adoption of vertical MOS transistors could enable a route to ultra-short channel MOS transistors using relaxed (hence cheaper) lithography rules and a reduced footprint. Classically, such devices are lateral but expensive lithography is required to achieve the ultra short channel lengths which are easily achieved with a vertical approach. The shortcomings of vertical transistors have been addressed by a number of novel solutions to drastically reduce parasitic effects generated by the geometric configuration of the device.

“We investigated the limits of using a vertical transistor and created new solutions in order to benefit fully from this approach,” says Professor of Electrical Engineering at Liverpool University, Stephen Hall. “We collaborated with Professor Peter Ashburn of Southampton University to research the device designs, processes and technologies to realise a viable route to high performance MOSFETs that can be manufactured at low cost.”

These transistors will play a significant role in the wider vision of ‘ambient intelligence', whereby a number of sensors and processors are linked by radio frequency. A simple application would be clothing tagged with sensors instructing a washing machine the best settings to wash at, when the items are placed in the drum.

“Innos dedicated a lot of effort on fabrication, process development as well as careful and close monitoring of all the technological steps involved when implementing the designs,” adds Lecturer at Liverpool University, Octavian Buiu. “In addition, we have secured EPSRC funding for a number of future ventures and we expect to have a similar efficient and successful collaboration with Innos on planned projects.”

One upcoming collaboration will see Liverpool University and Innos exploring the integration of MEMS and electronic circuits onto a single chip using Silicon on Insulator technology, for applications such as hearing aids. This involves putting together a solid state based microphone and the associated electronic circuits required for signal processing.

Sales and Marketing Director at Innos, Dr Alec Reader concludes, “Innos works to bridge the gap between academia and industry by working with top academic institutions to research and develop devices for low cost, mass manufacture and commercial applications. Our work with Liverpool and Southampton Universities demonstrates this vision.”

About Innos

Innos is the UK's leading research and development company for innovations in nanoscale technology. From its state-of-the-art silicon fabrication facility in Southampton, Innos provides industry and academic institutions with a full processing capability for silicon-based devices including lithography capability to below 10nm, using the world's most powerful electron beam lithography system. It has an expert team of engineers, technicians and academics in addition to over 20 years experience of silicon processing expertise, applying nanomaterials concepts to silicon-based devices. Innos has the most comprehensive tool-set and expertise to serve the market with the diverse and complete processes that are required. www.innos.co.uk