Nanotech, Inc., (OTC BB:AVNA.OB - News), the premier
provider of services, support and financing to drive
the commercialization of nanotechnology discoveries,
today announced that it has invested in the procurement
of an electron beam lithography (EBL) tool for use
on the development of Advance Nanotech technologies
at the University of Cambridge (United Kingdom). The
EBL will directly benefit researchers at the university
and at several of AVNA's portfolio companies in the
UK. The device will enable scientists to quickly and
accurately carve components for prototype nanodevices,
speeding the advancement of discoveries in nanotechnology.
The procurement was
made in partnership with The Centre for Advanced Photonics
and Electronics (CAPE) at the University of Cambridge
in the UK. CAPE is an integrated Research Facility
for Electrical Engineering with a staff of 22 academics,
70 post-doctoral researchers and 170 research students.
The CAPE program is funded by Advance Nanotech, Alps
Electric Company Limited, Dow Corning Corporation
and Marconi Corporation plc, and is designed to encourage
research activities to proceed to development and
exploitation in close collaboration with industry.
The program enables designers and engineers within
academia and industry to benefit from the burgeoning
developments in advanced photonics and electronics.
In the past five years, approximately 70 patents have
been filed and ten spin-out companies have been formed
from CAPE research projects.
goes hand-in-hand with Advance Nanotech's mission
to provide infrastructure and support for the discovery
and commercialization of nanotechnology through partnerships
with leading universities and fledgling companies,"
said Magnus Gittins, president and CEO of Advance
Nanotech. "The E-Beam technology speeds innovation
by enabling researchers to build, test and modify
nanodevices faster and more accurately than before."
EBL is a process that
employs a focused beam of electrons to transfer software-defined
patterns onto a silicon wafer with nanometer resolution.
The technology is typically used in designing or building
semiconductor devices, but can also be used to create
complex integrated circuits or photonic devices. As
the patterns are software defined, EBL allows researchers
to implement their ideas quickly and hence reduces
the time to market for new semiconductor devices.
NB0 electron beam lithography tool provides us with
rapid prototyping capabilities for building next generation
nanodevices," said Bill Milne, a member of the
Advance Nanotech Scientific Advisory Board and leader
of the CAPE research project. "With the ability
to accept wafers or samples up to 8" in diameter
through its 10 chuck airlock, this system allows us,
for the first time, to process a large range of samples
which are needed for various applications."
The Nanobeam EBL boasts
impressive throughput due to its large write current
of 10nA at <10nm beam size with a deflection throughput
of 30MHz. Recently, 50nm dots and 20nm lines (limits
due to processing, not tool spot size) were drawn
over a single 500x500um deflection field size. The
tool also has laser interferometry integrated into
its stage, allowing us to accurately pattern over
full 8" wafers. The automatic alignment and overlay
features of the EBL achieved stitching and registration
with errors less than 40nm."
About Advance Nanotech,
Advance Nanotech Inc.
is dedicated to ensuring nanotechnology discoveries
reach maximum market potential through successful
commercialization. Advance is the trusted guide to
commercial success for nanotech entrepreneurs spanning
the globe, partnering with leading universities to
provide scientists and researchers with mission critical
infrastructure support to transform their discoveries
to marketable solutions. The organization provides
a range of services and support including financing,
leadership assets, and counsel on intellectual property,
licensing and regulatory issues. With a portfolio
of nearly 20 companies developing technologies which
offer potentially breakthrough nanotechnology discoveries
in the electronics, biopharma and materials sectors,
Advance's goal is to transform the potential for nanotechnology
discoveries into innovative products that further
evolve existing industries and enable new markets.
About the Department
of Engineering, University of Cambridge
The Department of
Engineering at the University of Cambridge is one
of Europe's largest integrated engineering departments,
it provides a unique environment for the community
of academics to pursue their ideas, work together
in teams, and partner with others. The Department's
breadth and depth of expertise means that it is recognised
as an international leader.
The Department's new
strategy sets the aim of addressing the world's most
pressing challenges with science and technology, working
in collaboration with other disciplines, other institutions,
companies, and the entrepreneurial community. By attracting
the best academics and students in the world, the
Department excels at both research and teaching.
Department of Engineering:
Strategy for the Department
of engineering: http://www.eng.cam.ac.uk/news/stories/strategy/
About the University
The University of
Cambridge's reputation for outstanding academic achievement
is known worldwide and reflects the intellectual achievement
of its students, as well as the world-class original
research carried out by the staff of the University
and the Colleges.
As Cambridge approaches
its 800th anniversary in 2009, it is looking to the
future. It continues to change in response to the
challenges it faces. The modern University is an international
centre of teaching and research in a vast range of
subjects: about half of the students study science
or technology. Members of the University have won
over 80 Nobel Prizes. (www.cam.ac.uk)
RJ Bardsley, 781-487-4616
Investor Relations Contact:
Cormac Glynn, 212-732-4300