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Electronics...Nano
Elekronik
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Breakthrough
yields simple way to make microscopic electronics
Scientists achieve smallest-ever
spacing in nanoscale structures
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Stephen
Y. Chou
Joseph C. Elgin Professor of Engineering, Professor
of Electrical Engineering, Princeton University, Princeton
New Jersey USA
photo: Denise Applewhite (1999)
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In
a breakthrough that could lead to dramatically smaller
memory chips and other electronic components, Princeton
scientists have found a way to mass produce devices
that are so small they are at the limit of what can
be viewed by the most powerful microscopes.
The achievement is an advance over current techniques,
which require expensive and time-consuming procedures
to create anything so small. The technique offers
a relatively simple, low-cost production method that
may lead to greater memory capacity and lower costs
for computers, digital cameras and other devices.
In addition, the scientists achieved unprecedented
success in packing the minute structures into dense
clusters.
The researchers, led by engineering professors Stephen
Chou and Stephen Lyon, used a technique known as nanoimprinting,
in which they press a mold into a layer of softened
plastic on a silicon wafer, making microscopic patterns
on the surface of the plastic. The patterns can then
be transferred to the silicon where they could form
the basis of miniature electronic circuits that store
digital information.
The goal of the research was to determine how small
and dense a pattern could be pressed into plastic
with nanoimprinting, said Chou, who invented nanoimprinting
in 1994. "This work really pushes the limit down
to a few molecules in size," he said.
The scientists published their results in the June
28 issue of Applied Physics Letters. The other authors
of the paper include graduate students Michael Austin,
Wei Wu, Mingtao Li and Zhaoning Yu and postdoctoral
researchers Haixiong Ge and Daniel Wasserman.
The researchers reported that they created tall, thin
ridges only 5 nanometers (5 millionths of a millimeter)
wide. The researchers believe they made ridges even
narrower than 5 nanometers, but could not confirm
the results with existing microscopes. "So we
still do not know what the absolute limit is,"
said Chou.
An important aspect of the achievement is not just
the small size of the ridges, but also the amount
of space between the ridges, Chou said. The spacing,
known as "pitch," ultimately determines
the density of electronic memory that can be packed
onto a chip. In their published paper, the scientists
reported that they achieved a 14-nanometer pitch between
ridges. They have since reduced it to 12 nanometers.
That spacing is a 20-fold reduction compared to the
state-of-the-art techniques used in making today's
most advanced computer chips and would result in 400
times more memory in a two-dimensional memory chip,
Chou said.
The current method for making nanoscale devices is
to carve each piece individually with a beam of electrons,
a technique called electron-beam lithography. That
process does not achieve the 14-nanometer pitch of
nanoimprinting and requires equipment that is much
more expensive than anything used in Chou's technique.
The key to the result was the collaboration between
the labs of Chou and Lyon and the combination of their
different areas of expertise. Chou, the pioneer of
nanoimprinting, was looking for improvements in the
molds he uses for pressing patterns into plastics.
His standard method for making a mold was to use electron-beam
lithography to carve the desired pattern in a piece
of silicon, which is then pressed into plastic. This
approach is limited by the narrowness of the electron
beam, which carves out a U-shaped channel about 20
nanometers wide.
To improve on this level of precision, Chou turned
to Lyon, an expert in a technology called molecular-beam
epitaxy, which Lyon uses to grow flat sheets of crystals
just a few molecules thick. Members of Lyon's lab
grew alternating layers of two materials until they
had a wafer hundreds of layers thick. Researchers
in Chou's lab then cut the wafer, exposing the edges
of the layers. They applied a chemical that ate away
one of the two materials but not the other. The result
was a very fine comb-like pattern in which all the
teeth and valleys were perfectly smooth and square
with atomic precision. The researchers used this creation
as their mold.
This mold-making process, though time-consuming, would
need to be done only once in setting up a manufacturing
process, said Chou. Once the mold is made, it can
be used to make countless copies very rapidly.
The research is the latest in a series of nanoimprinting
advances Chou has made in recent years. In 2003, Technology
Review magazine, published by the Massachusetts Institute
of Technology, identified Chou's work with nanoimprinting
as one of "10 emerging technologies that will
change the world." His latest study was funded
in part by the Department of Defense Advanced Research
Projects Administration.
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This
story has been adapted from a news release -
Diese Meldung basiert auf einer Pressemitteilung -
Deze
tekst is gebaseerd op een nieuwsbericht - |
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