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Eindhoven,
the Netherlands – A team of scientists from Philips
and the Kavli Institute of Nanoscience Delft has announced
to be the world’s first to successfully demonstrate
the growth of III-V semiconductor nanowires on germanium
and silicon substrates. In their article published
in today’s issue of Nature Materials, they present
a detailed study of this important step towards the
integration of the superior high frequency and optoelectronic
properties of III-V semiconductors with the huge silicon
technology base of the semiconductor industry.
Up
till now, III-V semiconductors could not be fabricated
on silicon or other group IV materials by the conventional
fabrication route of thin-film deposition and lithographic
structuring. This is caused by fundamental issues
such as lattice and thermal expansion mismatch, which
prevent a growth mode in which the crystallographic
structure of the substrate is copied in the layer
grown on top (“epitaxial growth”). This growth mode
is essential to produce the required material properties
such as a low interface resistance, which is important
for future electronic devices such as transistors
and light-emitting diodes.
The
team solved the problem by growing the III-V material
in a “bottom up” approach, i.e. instead of growing
a layer over the entire substrate and removing the
parts that are not needed, III-V materials, in the
form of nanowires, is only grown at substrate locations
where it is needed. Because this results in many small
individual structures rather than one large connected
layer, the mechanical stress with the substrate is
relieved easier and perfect epitaxial growth can indeed
be achieved.
The
key to achieve this type of growth was the use of
the vapor-liquid-solid (VLS) method to grow the semiconducting
nanowires. In this method, metal (gold) seeds are
deposited (using conventional lithography) at the
substrate locations where the nanowires should grow.
Then the semiconductor material is applied to the
substrate in vapor form. The vapor dissolves into
the metal seeds, and when this mixture becomes oversaturated,
growth of the semiconducting material in the form
of a nanowire starts. “Although this process is not
new, our team of Philips and the Kavli Institute of
Nanoscience was the first to apply it successfully
to grow III-V materials on silicon and germanium substrates”,
said Dr Erik Bakkers, senior scientist at Philips
Research and first author of the article in Nature
Materials.
The
team showed that perfect epitaxial growth, with atomically
smooth interfaces and low contact resistance could
be reached, providing an excellent base to explore
these materials in devices such as transistors, integrated
circuits and light-emitting diodes.
III-V
semiconductors are alloys comprising elements from
the groups III (e.g. gallium or indium) and V (e.g.
arsenic or phosphor) of the periodic table of the
elements. Many of these alloys, for example gallium-arsenide
(GaAs) or indium-phosphide (InP) are attractive candidates
for high-frequency (e.g. high-bandwidth connectivity)
or optoelectronic (e.g. integrated optics or LEDs)
applications. Until now, devices using these materials
are grown onto substrates of the same class, making
them rather exclusive and expensive. In the article
in Nature Materials, the scientists describe the growth
of InP nanowires on germanium substrates. In the meantime,
the team has also succeeded in growing InP on silicon
substrates, setting an important step towards the
application of III-V materials in the mainstream,
silicon-based semiconductor industry.
About
Royal Philips Electronics
Royal Philips Electronics of the Netherlands (NYSE:
PHG, AEX: PHI) is one of the world’s biggest electronics
companies and Europe’s largest, with sales of EUR
29 billion in 2003. With activities in the three interlocking
domains of healthcare, lifestyle and technology and
166,800 employees in more than 60 countries, it has
market leadership positions in medical diagnostic
imaging and patient monitoring, color television sets,
electric shavers, lighting and silicon system solutions.
News from Philips is located at http://www.philips.com/newscenter.
About
the Kavli Institute of Nanoscience Delft
The Kavli Institute of Nanoscience consists of 100+
scientists grouped in six renowned research groups
and a nanofacility cleanroom within Delft University
of Technology in the Netherlands, all aimed at innovative
research at the current frontier of science on a nano-scale.
Named “Kavli Institute” in 2003, the research groups
focus on the physics of nanostructures with emphasis
on electronic transport phenomena in individual objects.
The nanostructures vary from superconductors to biopolymers
and are obtained from nature or fabricated with bottom-up
methods or top-down techniques. More information can
be found at www.nanoscience.tudelft.nl.
For
further information please contact:
Philips Research / Public Relations Department
Koen Joosse
Tel.: +31.40.2743703
E-mail: koen.joosse@philips.com
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