(Chicago, Ill – May 25, 2004) NanoInk, Inc announces the availability of the Bias Control Option for its NSCRIPTOR nanolithography system. This added feature makes the NSCRIPTOR a powerful instrument for the fabrication of nanoscale electronic components. The Bias Control Option offers the functional capability of creating an electric field between the probe tip and the sample substrate. This feature allows the researcher to perform oxidation nanolithography, so that they may selectively oxidize a semiconductor surface with insulating nanoscale patterns, and also enables the deposition of conductive nanoscale structures onto semiconductor surfaces via electrochemical DPN™ methods.

The NSCRIPTOR instrument is a dedicated nanolithography system that patterns nanostructures by leveraging the extreme precision of scanning probe technology. The instrument is optimized for the Dip Pen Nanolithography™ process, in which a molecular “ink” is directly deposited from the probe tip (or “pen”) onto the substrate. The NSCRIPTOR also incorporates multi-pen writing arrays, in addition to harnessing the chemical versatility of inks afforded by DPN™ (i.e., metals, polymers, biomolecules, alkanethiols, and sol gels). The Bias Control Option capability enables all types of electrochemical DPN (such as conducting metal nanostructures), as well as nanoscale probing, catalysis, electrical characterization, and oxidation nanolithography.

The Bias Control Option works in both contact and AC modes, and includes a signal switch box (allowing external triggering), a modified sample holder, scanner connectivity junctions, conductive probes, and associated cabling. Finally, the Bias Control Option has been fully integrated into the NSCRIPTOR user interface (InkCAD™), providing user friendly control of bias voltage, timing, and nanoscale placement. Now, with the ability to control bias, NSCRIPTOR technology points the way to a new realm of applications, devices, and fundamental physics research.

About NanoInk, Inc.

NanoInk’s mission is to become the world leader in nanometer-scale manufacturing and applications development. Through innovative strategic and co-development partnerships NanoInk provides leading companies in a variety of industries with access to its revolutionary and patented technology, Dip Pen Nanolithography™ (DPN ™). Because of its unmatched flexibility, high resolution, accuracy, scalability and low cost, NanoInk’s integrated, bottom-up technology allows the development of new or improved products that would have been impossible or cost-prohibitive to create in the past. Near-term applications of DPN will be focusing on nanoscale additive repair, nanoscale brand protection, and nanoscale rapid prototyping. NanoInk continues to build its robust intellectual property portfolio – which includes several patents issued in the U.S. and Taiwan and in-licensing agreements with Northwestern University and Stanford University – by filing over 90 patent applications worldwide. For more information, please visit www.nanoink.net.