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A
Sharper Focus for Soft x-rays
Zone Plate Lenses Capable of Better than 15-Nanometer Resolution
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BERKELEY, CA – Progress in nanoscience and nanotechnology depends not only on
examining the surfaces of things but on seeing deep inside biological organisms
and material structures to identify what they're made of — and what electronic,
magnetic, optical, and chemical processes may be in play
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The Center for X-Ray Optics' new technique for
creating high-resolution zone plates involves two
separate patterns of alternating zones fabricated
sequentially and overlaid on the same wafer.
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For
measuring internal variations in shape, organization,
magnetism, polarization, or chemical make-up over
distances of a few nanometers (billionths of a meter),
x-ray microscopy not only complements electron microscopy
but also offers important advantages. The XM-1 x-ray
microscope at the Advanced Light Source, located
at the Department of Energy's Lawrence Berkeley National
Laboratory, uses bright beams of "soft" x-rays to
produce images that not only reveal structures but
can identify their chemical elements and measure
their electromagnetic and other properties as well.
Now
a new method for creating optical devices with
nanoscale accuracy has allowed researchers in Berkeley
Lab's Center for X-Ray Optics (CXRO), which built
and operates the XM-1, to achieve an extraordinary
resolution of better than 15 nanometers, with the
promise of even higher resolution in the near future.
CXRO's Weilun Chao, Bruce Harteneck, Alexander Liddle,
Erik Anderson, and David Attwood describe their achievement
in a letter to Nature , June 30, 2005.
"Our new technique permits fabrication of remarkably
small three-dimensional structures," says Weilun
Chao of Berkeley Lab's Materials Sciences Division,
who helped develop the technique as part of his recent
doctoral thesis in the Electrical Engineering and
Computer Sciences Department at the University of
California at Berkeley. "We believe this is a breakthrough
in the difficult process of fabricating small structures
by means of electron beam lithography."
Since
x-rays can't be focused by glass lenses, the XM-1
uses lenses made of zone plates, disks of concentric
rings of metal from which soft x-rays are diffracted
to a focus. An objective lens called a "micro" zone
plate (MZP) projects a full-field image of the sample — whether
the interior of frozen bacteria or layers of a magnetic
alloy — onto a charge-coupled device. The smaller
the gap between the MZP's rings, the tighter the
focus, and the higher the resolution of the image.
CXRO
fabricates its own zone plates with an electron-beam
lithography tool called the Nanowriter. An energetic
beam of electrons just 7 nanometers wide carves
preprogrammed patterns in a silicon wafer coated
with a resist. The carved-out circular patterns
in the resist are then replaced with opaque gold
to form an object that under magnification superficially
resembles a long-playing gold record album — but
one only 30 micrometers (millionths of a meter)
in diameter. |

With the new technique the zones were spaced approximately
15 nanometers apart (30 nanometers between the centers
of each gold zone). Future improvements will be directed
at narrower zones with no gaps and even closer spacing.
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To
achieve high resolution depends on the ability to
squeeze the zones close together, with a placement
accuracy no less than one-third the width of the
zones themselves. Accurate placement of 15-nanometer-wide
zones allows no more than 5-nanometer leeway. In
fact the Nanowriter is capable of placement accuracy
to within 2 nanometers, allowing for even greater
improvements in resolution in the future.
Unfortunately, no matter how accurately it is aimed,
even a tight beam of electrons spreads out when it
hits the resist. Electron scattering, combined with
inherent limits in the resolution of the resist itself,
makes it impossible at this time to maintain high
contrast and optical separation between features.
Previously the best separation between zones the
Nanowriter could achieve to make the XM-1's current
objective lens was 25 nanometers.
To overcome this limit, the CXRO researchers decided
to overlay and combine two different zone-plate patterns.
Opaque zones are typically given even numbers, so
in this scheme the first pattern contains zones 2,
6, 10, 14, and so on, and the second contains zones
4, 8, 12, 16, and so on. The first pattern is carved
into the resist-coated wafer; then the zones formed
by the electron patterning are filled with gold.
The wafer is coated with resist again to make the
second pattern.
When combined, the critical outer zones of the combined
patterns were less than 15 nanometers apart, accurately
placed to within less than 2 nanometers. Aligning
the separately processed patterns was the key to
success. Accuracy was achieved with software that
calculated the deflection and distortion of the Nanowriter's
beam as it traced out the concentric circular patterns.
The placement of the zones in the first MZP made
with this technique was nearly perfect, although
there was room for improvement in other areas. The
opaque gold zones were broken by tiny gaps, and they
were wider (and the transparent zones between them
narrower) than they should have been, reducing the
zone plate's efficiency. Nevertheless, the experimental
MZP was used to obtain images sharper than any previously
achieved with an x-ray microscope. |

With the new zone plate the XM-1 microscope was
able to image a test pattern of layers of chromium
and silicon only 15nm thick, sliced crossways (right).
The XM-1's previous objective zone plate, capable
of 25-nanometer resolution, could not resolve an
image of the test pattern (left).
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Not
only were images of test patterns (lines formed by
layers of chromium and silicon in cross-section)
sharper than those made with the XM-1's current 25-nanometer-resolution
MZP, the new MZP was able to obtain sharp images
of lines a mere 15 nanometers apart — where the older
zone plate had seen only a featureless field of gray.
"Nanoscience and nanotechnology are everywhere around
us — biology and chemistry are nanoscience by nature — but
we need better analytical tools to see what we're
looking at," says David Attwood of the Materials
Sciences Division, founder and former director of
the Center for X-Ray Optics and a professor of electrical
engineering at UC Berkeley. "Electron microscopy,
scanning-tunneling microscopes, atomic-force microscopes — they're
all good, but they can't give you identification
of chemical elements and compounds. The great advantage
of photons is that there are very specific differences
in their interactions with atoms: you can tell when
you're looking at iron; you know when you're looking
at cobalt."
Because
they need bright beams of photons, x-ray microscopes
are presently found only at synchrotrons like those
in the United States that are sponsored by the
Department of Energy. In their letter to Nature,
however, the CXRO researchers suggest that before
too many years new sources of very bright, soft x-rays — for
example, from compact, laser-based x-ray sources — will
make it possible to build x-ray microscopes that
will fit on the bench top. Nanoscience and nanotechnology
will be both the beneficiaries and the driving forces
behind the widening horizon for nanoscale analysis,
which has been opened by the new techniques in soft-x-ray
optics.
"Soft x-ray microscopy at a spatial resolution better
than 15nm," by Weilun Chao, Bruce D. Harteneck, J.
Alexander Liddle, Erik H. Anderson, and David T.
Attwood, appears in the 30 June 2005 issue of Nature
.
Berkeley Lab is a U.S. Department of Energy national
laboratory located in Berkeley, California. It conducts
unclassified scientific research and is managed by
the University of California. Visit our website at http://www.lbl.gov .
Additional information
Contact: Paul Preuss, (510) 486-6249, paul_preuss@lbl.gov
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This
story has been adapted from a news release -
Diese Meldung basiert auf einer Pressemitteilung -
Deze
tekst is gebaseerd op een nieuwsbericht - |
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