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Albany
NanoTech Enhances State-of-the Art Lithography
Research with New EUV Source from Energetiq
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| Company Press Release
05-07-2005
Albany, NY – Albany
NanoTech, a leading global center for nanotechnology
research, development and deployment, today announced
the delivery of a new state of the art tool for extreme
ultraviolet (EUV) lithography research, built by Energetiq
Technology, Inc., a developer and manufacturer of advanced
short wavelength light products for use in high technology
applications.
The new tool, the EQ-10M, is a 10 watt, high brightness EUV light source which
will be used for metrology research applications at the UAlbany College of Nanoscale
Science and Engineering (CNSE) at Albany NanoTech, the first college in the nation
devoted exclusively to the study of nanoscale scientific concepts. The EQ-10M,
based on Energetiq's unique Electrodeless Z-PinchTM technology, is among the
most advanced tools of its kind in the world and will serve to further augment
Albany NanoTech's capabilities as a global center for advanced lithography research.
"Energetiq has developed a truly innovative EUV light source that is likely to
significantly enhance EUV metrology, making mask inspection faster as well as
more reliable and cost-effective," said Gregory Denbeaux, Ph.D., Assistant Professor
of Nanoscience at CNSE. "This tool will play a significant role in our lithography
research program as we move to 13.5 nm lithography – the most advanced research
taking place today."
"We are delighted to collaborate with the world-class EUV group at UAlbany. With
our Electrodeless Z-Pinch technology, we have developed an EUV source that is
robust, flexible and cost effective. Our technology provides researchers with
the EUV power and high brightness needed for advanced applications." stated Paul
Blackborow, CEO of Energetiq. "By enabling Dr. Denbeaux's research in advanced
metrology we hope to keep EUV lithography on track to reach high volume manufacturing
by the end of the decade."
Lithography is the process of using light to imprint patterns on semiconductor
materials that are used for integrated circuits. Lithography is one of the key
technologies that has enabled the semiconductor industry to meet the challenge
of Moore's Law by allowing a 30% decrease in the size of printed dimensions every
two years. EUV lithography is central to the future miniaturization of semiconductor
devices since it deals in light with a a wavelength of approximately 13.5 nanometers,
significantly smaller than the current 193 nm tools currently used in semiconductor
manufacturing.
EUV discharge plasma sources produce light by passing a current through a gas,
causing the atoms in the gas to heat sufficiently that they emit the very short
wavelength EUV light. Traditionally, EUV sources have used a pair of electrodes
through which the current is passed. These electrodes can overheat causing debris
that may end up in the optical system. The Energetiq EQ-10M is distinct in that
it employs an electrode-free technology by coupling the current inductively into
the discharge plasma.
Professor Denbeaux's research focuses on high resolution imaging, which requires
a very small, bright point source of light. Using Xenon gas, which is simple
to manipulate and non-toxic, the EQ-10M is designed to make a very small plasma
producing a bright, high-powered light source. The EQ-10M will be up and running
for experimentation by July 2005.
About Albany NanoTech
One of the largest global centers for nanotechnology, Albany NanoTech is home
to the College of Nanoscale Science and Engineering (CNSE) and the New York State
Center of Excellence in Nanoelectronics (NYSCEN) of the University at Albany-State
University of New York. Its 450,000 square foot complex, including the only 200mm/300mm
wafer facilities in the academic world, encompasses nanoelectronics, system-on-a-chip
technologies, biochips, optoelectronics and photonics devices, closed-loop sensors
for monitoring, detection, and protection, and ultra-high-speed communication
components.
With over 65,000 square fee of Class 1 capable 300 mm wafer cleanrooms, as well
as on-site faculty and student researchers, Albany NanoTech provides corporate
partners with a unique environment to pioneer, develop, and test new nanoscience
and nanoengineering innovations within a technically aggressive and financially
competitive R&D environment. For more information, visit our website at www.albanynanotech.org .
About Energetiq Technology, Inc.
Energetiq, based in Woburn, Massachusetts, was founded in March, 2004 with a
mission to be the preeminent developer and manufacturer of short wavelength light
sources for use in the analysis and fabrication of nano-scale structures and
products. The members of the Energetiq team have been responsible for developing
many high power plasma sources that run daily in semiconductor fabrication facilities
around the world. Energetiq's goal is to leverage this expertise to develop novel,
cost effective, short wavelength light sources that will enable the production
of next generation devices. The company's products can be used in lithography,
metrology, inspection, resist and thin-film processing and R&D applications.
For more information, visit our website at www.energetiq.com .
Contact:
Shonna Keogan
Albany NanoTech
Phone: 518-956-7201
skeogan@uamail.albany.edu
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