| SCHÄRDING,
Austria - July 8, 2004 - EV Group, a leading supplier
of wafer-bonding and lithography equipment, today announced
that it has developed an advanced aligner technology
that improves competitiveness of full-field lithography
by providing the industry’s highest alignment accuracy
and resolution at lowest cost of ownership. The new
NanoAlign Technology features active run-out control
and sub-100nm dynamic alignment resolution, complemented
by UV-Nanoimprint (UV-NIL) capability.
EV
Group’s NanoAlign Technology is especially useful
for packaging up to 300-mm wafers, UV-NIL, micro-contact
printing, SAW devices and optical gratings. It is
available on all EV Group’s mask aligner platforms,
including the all-new EVG6200 Infinity aligner. The
Infinity, which will be launched in the North American
market during SEMICON West, is designed for all MEMS,
compound semiconductor, nanoimprint lithography and
power-device applications, as well as the wafer-bumping
and chip-scale packaging markets.
“Our
NanoAlign technology will enable our customers to
use 1X full-field Lithography as a more cost-effective
alternative to step-and-repeat approaches in markets
such as advanced packaging,” said Dr. Peter Podesser,
chief executive officer of EV Group. “This combination
of NanoAlign Technology’s standard-setting accuracy,
resolution and value with the entirely new Infinity
aligner positions EV Group at the forefront of this
market,”
The
Infinity supports a wide range of configurations,
including large gap alignment, bowed and thin wafer
processing. The fully automated EVG6200 Infinity offers
unmatched investment protection, in part because it
can be reconfigured and upgraded onsite with unique
alignment and bonding features.
The
EVG6200 Infinity is the culmination of EV Group’s
new aligner-technology roadmap, with features for
manufacturing of a variety of 75mm-to-300mm wafers.
With full-field proximity exposure of very thick resist
layers, the new aligner is optimized for highest throughput,
highest mean time between failures and most accurate
print-gap settings.
The
company’s aligner-technology roadmap has evolved through
extensive discussions with customers and was supported
by EV Group’s recognized strengths and commitment
to research and development. EV Group’s new aligner
roadmap, which includes upgrades of the EVG620 and
the IQ Aligner, positions the company to serve customers
with both pilot and high-volume production needs.
The
new aligner, which already has been ordered by several
customers, also features the unique bond-alignment
capabilities of EV Group’s existing aligners, the
EVG620 and the IQ Aligner.
About EV Group
Founded in 1980, EV Group is a global supplier of
wafer bonders, aligners, photoresist coaters, cleaners
and inspection systems for semiconductor, MEMS and
emerging nanotechnology markets. EV Group holds the
dominant share of the market for wafer bonding equipment
(especially SOI bonding) and is a leader in lithography
for advanced packaging and nanotechnology. The company’s
unique Triple I approach (Invent – Innovate – Implement)
is supported by a vertical infrastructure, allowing
EV Group to respond quickly to new technology development,
apply the technology to manufacturing challenges and
expedite volume production. Headquartered in Schärding,
Austria, EV Group operates via a global customer support
network, with subsidiaries in Phoenix, Arizona; Cranston,
Rhode Island; Yokohama, Japan; and Chung-Li, Taiwan.
For more information, visit www.EVGroup.com <http://www.EVGroup.com/>
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