FRANKLIN, Mass.--(BUSINESS WIRE)--Oct. 26, 2004--Extraction Systems today announced that the Albany NanoTech Research Center at the University at Albany-SUNY has ordered the company's E3000 filter system. The center will use the E3000's proprietary hybrid filter technology to control molecular contamination in one of the world's first 193 nm immersion lithography tools.

"Albany NanoTech is a focal point of micro- and nanotechnology development today," said Devon Kinkead, president of Extraction. "By supporting its immersion lithography program, we hope to gain additional insights into the mechanics of molecular contamination in immersion lithography processes and ultimately help bring this promising technology into full production."

Immersion lithography is widely seen as a possible successor to conventional 193 nm lithography. Under evaluation at Albany NanoTech and other organizations throughout the industry, immersion lithography introduces a liquid between an exposure tool's projection lens and the wafer. The technique has been shown to offer better depth of focus over conventional projection lithography, allowing device makers to produce smaller features using 193 nm wavelength light.

"As a company dedicated to molecular contamination control in lithography, Extraction will play an important role in our 193 nm immersion lithography program," said Michael Tittnich, Strategic Program Manager for Albany NanoTech. "In the development of new processes like immersion lithography, we need to reduce process variables. Advanced, field-proven filtration helps us do this, leading to smoother, faster introduction of new technologies."

The E3000 filter system will protect Albany NanoTech's 193 nm immersion exposure tool optics and resists from a broad range of molecular acids, bases and condensable organics. The system combines proven contamination control methods for resists with Extraction's next-generation filtration technology for optics, helping preserve illumination uniformity, intensity and lens life.

This is the second time the Albany NanoTech center has selected Extraction's molecular contamination control technology. Last year, the center installed Extraction's TMB 150 real-time molecular contamination monitor to support its 157 nm lithography systems.

About Albany NanoTech

One of the largest global centers for nanotechnology, Albany NanoTech is home to the College of Nanoscale Science and Engineering (CNSE) and the New York State Center of Excellence in Nanoelectronics (NYSCEN) of the University at Albany-State University of New York. Its 450,000 square foot complex, including the only 200mm/300mm wafer facilities in the academic world, encompasses nanoelectronics, system-on-a-chip technologies, biochips, optoelectronics and photonics devices, closed-loop sensors for monitoring, detection, and protection, and ultra-high-speed communication components.

With over 65,000 square feet of Class 1 capable 300 mm wafer cleanrooms, as well as on-site faculty and student researchers, Albany NanoTech provides corporate partners with a unique environment to pioneer, develop, and test new nanoscience and nanoengineering innovations within a technically aggressive and financially competitive R&D environment.

About Extraction

Extraction produces a wide range of molecular contamination measurement and control products for ultraclean environments. Headquartered in Franklin, Mass., the company provides solutions to the global microelectronics industry in partnership with Metron Technologies in Europe, Woowon in Korea; AOV in China; Hakuto Co. in Japan, and with Hermes Systems in Taiwan. http://www.extraction.com.

Contacts


Company Contacts:
Extraction Systems
Devon Kinkead, 508-553-3900
dkinkead@extraction.com
or
John Higley, 508-553-3900
jhigley@extraction.com
or
Agency Contact:
Loomis Group
Marlene Berrios, 617-638-0022
berriosm@loomisgroup.com
or
Shonna Keogan
Communications Consultant, Albany NanoTech
518-956-7201
skeogan@uamail.albany.edu