UV-NIL is a next-generation lithography technology and a contender to succeed optical lithography for the 32-nm node, according to the International Technology Roadmap of Semiconductor (ITRS). Applications include integrated photonic devices, nanoelectronics, life sciences, patterned media and next-generation memories.

"Nanoimprint lithography is an innovative patterning technology that provides a lower cost-of-ownership model compared to current manufacturing lithography tools," said Dr. Peter Podesser, chief executive officer of EV Group. "EV Group has the largest installation base worldwide for single-step imprinting equipment and this new NIL stepper enhances our product portfolio substantially."

AMO, which has been participating in joint-development programs with EVG in the area of advanced UV-NIL since 1997, is a leading research center for the technology. In addition, AMO is a charter member of NILCom, the consortium founded by EV Group that is dedicated to speeding the commercialization of NIL. NILCom is a technology platform supported by an established infrastructure and qualified processes, including leading technology companies and research centers. Its mission is to establish a high-volume manufacturing NIL platform in nano-electronics, data storage, life sciences and opto-electronics.

The special features of EV Group's new NIL stepper include a dual-stage alignment approach in lower pressure environments, which enhances pattern fidelity compared to other technical solutions in ambient pressure. The step-and-repeat NIL system targets sub-50-nm overlay alignment accuracy and a lithography resolution down to 10 nm. The system will be delivered in the first quarter of 2005.

About AMO GmbH / AMICA
The private non-profit company AMO GmbH (Gesellschaft für angewandte Mikro- und Optoelektronik) is committed to applied research in the area of micro-, nano- and optoelectronics since 1997. The department AMICA (Advanced Microelectronic Center Aachen) is dedicated to nano lithography technology with major emphasis on UV-NIL activities. Mature Electron-Beam Lithography, down to sub 10 nm features, and CMOS process technology has been the basis for application studies of UV-NIL research, which is being improved in terms of resolution, overlay precision and reliability. For more information on AMOs research activities and services please visit www.amo.de.

About EV Group
Founded in 1980, EV Group is a global supplier of wafer bonders, aligners, photoresist coaters, cleaners and inspection systems for semiconductor, MEMS and emerging nanotechnology markets. EV Group holds the dominant share of the market for wafer bonding equipment (especially SOI bonding) and is a leader in lithography for advanced packaging and nanotechnology. The company's unique Triple I approach (Invent Innovate Implement) is supported by a vertical infrastructure, allowing EV Group to respond quickly to new technology development, apply the technology to manufacturing challenges and expedite volume production. Headquartered in Schärding, Austria, EV Group operates via a global customer support network, with subsidiaries in Tempe, Arizona; Albany, New York; Yokohama and Fukuoka, Japan; and Chung-Li, Taiwan. For more information, visit www.EVGroup.com.