16-09-2005 - Leuven, Belgium -- IMEC's ASML
XT:1250i step-and-scan system has been upgraded with
state-of-the-art hardware last month. The first exposures
show excellent performance in three key areas: improved
CD uniformity across the wafer, improved overlay numbers
up to values comparable to dry 193nm lithography, and
a spectacular reduction in patterned defectivity.
At the second International Symposium on Immersion
Lithography, IMEC presented the first conclusive
exposure results on its recently upgraded ASML XT:1250i
immersion lithography tool:
· CD
uniformity across the wafer was about two times
better as compared with results obtained with
the first generation immersion hardware. This
is due to scanning over the edge with better
focus control.
· Overlay performance was improved to comparable numbers as dry 193nm
lithography, thanks to the new ASML stage design.
· Defectivity data showed a spectacular reduction in number of defects,
going down to 0.037 defects/cm².
These
results were obtained in the framework of the IMEC
Industrial Affiliation Program on immersion lithography,
which unites more than 30 major players in the
field of immersion lithography. [See also news
release: http://www.imec.be/wwwinter/mediacenter/en/ARRM2004_Immersion.shtml]
"Our strategic partnership with ASML is a cornerstone of the IMEC Industrial
Affiliation Program on immersion lithography," said Luc Van den hove, Vice President
Silicon Process and Device Technology. "When the program started one year ago
we were able to provide our partners access to one of the first full-field step-and-scan
systems from ASML. We are very proud that we can show our partners these unique
and very positive results obtained on the upgraded system. They prove that the
major critical issues for immersion lithography can be overcome making immersion
a viable and manufacturable technology for the 45nm node." "This IMEC Industrial
Affiliation Program marks significant progress in 193nm immersion lithography," said
Martin van den Brink, ASML Executive Vice President, Marketing and Technology. "Together
with our program partners, we see results that demonstrate the technology
leadership of ASML immersion systems."
Note for the editors:
About ASML
ASML is the world's leading provider of lithography systems for the semiconductor
industry, manufacturing complex machines that are critical to the production
of integrated circuits or chips. Headquartered in Veldhoven, the Netherlands,
ASML is traded on Euronext Amsterdam and NASDAQ under the symbol ASML.
About IMEC Industrial Affiliation Programs
The IMEC Industrial Affiliation Program (IIAP) is IMEC's premier
R&D collaboration
formula for joint R&D between industrial researchers and IMEC
research teams. IIAPs focus on a specific topic or technology area.
The concept is recognized worldwide as one of the most successful
international partnership models for joint development of next-generation
technologies.
About IMEC
IMEC is a world leading independent research center in nanoelectronics and
nanotechnology. Its research focuses on the next-generation of chips and systems,
and on the enabling technologies for ambient intelligence. IMEC's research
bridges the gap between fundamental research at universities and technology
development in industry. Its unique balance of processing and system know-how,
intellectual property portfolio, state-of-the-art infrastructure and a strong
network of companies, universities and research institutes worldwide, positions
IMEC as a key partner with which to develop and improve technologies for future
systems.
IMEC is headquartered in Leuven, Belgium and
has representatives in the US, China and
Japan. Its staff of more than 1300 people
includes over 380 industrial residents and
guest researchers. In 2003, its revenues
were EUR 145 million. Further information
on IMEC can be found on
www.imec.be .
For more information:
Katrien Marent
Corporate Communication Manager
IMEC, Kapeldreef 75
B- 3001 Leuven, Belgium
Tel +32 16 28 18 80 Fax +32 16 28 16 37
Email: Katrien.Marent@imec.be
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